DESCRIPTION

The X-ray scanner is an exposure station designed for deep-etch X-ray lithography using synchrotron radiation to fabricate structures in X-ray sensitive polymers (resists) like PMMA. Shadow projection is used to transfer the absorber structures of a mask membrane into a light sensitive resist layer coated on a base plate.Microstructures can be fabricated with high spatial resolution (200 nm for a wall thickness of 100um) High aspect ratio (up to 40) Great structural heights (up to 3mm). To enable the defined selection of an exposure area, motor-driven aperture blades have been installed in horizontal and vertical direction. DEX02 featured a fully automatic exposure procedure, Scanning speed 1:50 mm/sec. 4” Mask and resist substrate. Resist Material: PMMA, SU8. Set of 5 filters. Exposure Area A=54 mm x 84mm

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Elettra Sincrotrone Trieste

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste Italy

DXRL Beamline

Contact person

Alessio Turchet & Benedetta Marmiroli (TU Graz)

Elettra +39-0403758630

alessio.turchet@elettra.eu

benedetta.marmiroli@elettra.eu

DESCRIPTION

The UV -KUB 3 is a mask aligner designed for laboratories and technological platforms in microelectronics, optics, biology, microfluidics. This UV station features a fully enclosed system ensuring a total user protection against UV rays with an hermetic exposure chamber. Intuitive tactile user interface.Low divergence, strong illumination monochromatic wave lenght.Accepted photomask size 5”x5” (127x127 mm maximum).Accepted substrate size 2” and 4”. Visualization system resolution 3um. Mask/substrate distance resolution 0.5 um. Exposure mode available continue/pulsed.Half angle divergence beam:< 2º.Wavelenght:365 nm.Illumination:35mW/cm^2. The UV station is equipped with a WS-650MZ-23NPPB Spin Coater anda a hot plate

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement

LOCATION

Elettra Sincrotrone Trieste,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste Italy

DXRL Beamline

Contact person

Alessio Turchet & Benedetta Marmiroli (TU Graz)

Elettra +39-0403758630

mailto:alessio.turchet@elettra.eu

benedetta.marmiroli@elettra.eu

DESCRIPTION

Plasma system currently working with O2 (Oxygen). The system is indicated for resist residual layer removing and surface cleaning . The system has an aluminum reaction chamber.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Elettra Sincrotrone Trieste,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste Italy

DXRL Beamline

Contact person

Alessio Turchet & Benedetta Marmiroli (TU Graz)

Elettra +39-0403758630

alessio.turchet@elettra.eu

benedetta.marmiroli@elettra.eu

DESCRIPTION

Soft X-ray microscopy has already been recognized to be a very powerful tool for understanding the complex processes occurring at the submicron length scales. TwinMic soft X-ray microscope of the Elettra Laboratory can provide absorption and differential phase contrast imaging, with spatial resolution from a few micrometers down to 100nm, coupled with low energy X-ray Fluorescence (LEXRF) for elemental mapping of light elements, starting from B and covering the K and L edges of all elements in the energy range 190 to 2200 eV.

ACCESS

The use of the instrument require the presence of a trained operator.

LOCATION

Elettra Sincrotrone Trieste,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste Italy

TwinMic Beamline

Contact person

Alessandra Gianoncelli

Elettra +39-0403758753

alessandra.gianoncelli@elettra.eu

DESCRIPTION

Small Angle X-ray Scattering (SAXS) is a non-destructive method to study the nanoscale structure of any type of material ranging from new composite nanosystems to biological macromolecules. Parameters as (i) averaged particle sizes, shapes and distributions, (ii) the materials' porosity and degree of crystallinity as well as (iii) electron density maps with nanometer precision can be obtained. Materials can be solid, liquid or even exhibit gaseous-like properties as for instance aerosols.

Time-resolved studies on structural transitions can be performed in different time scales down to the sub-millisecond time region in solutions and partly ordered systems containing structures of up to 100 nm in real-space. Also self-assembly processes on surfaces, or structural characterisations of thin films, can be studied.

SAXS measurements can be performed with many different sample environments (i.e. autosampler, flow through cell, humidity cell etc). Simultenously to SAXS, also Differential Scanning Calorimetry (DSC) and Wide Angle X-ray Scattering (WAXS) recordings can be done. Users have the possibility to use our various sample holders (e.g., rapid mixing; T-scans; pressure cell, …), or to install their own specialized sample equipment.

ACCESS

The use of the beamline requires the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Elettra Sincrotrone Trieste,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste, Italy

Contact person

Dr. Sigrid Bernstorff (Elettra) & Heinz Amenitsch (TU Graz)

Elettra +39-0403758572 & +39-0403758044

https://www.elettra.eu/elettra-beamlines/saxs.html

sigrid.bernstorff@elettra.eu

DESCRIPTION

Cross Beam Zeiss including high resolution SEM and focused ion beam column (FIB). Hgh resolution imaging even at low energies, nano-milling, Electron Beam and Ga ion beam lithography system. As Scanning Electron Microscope (SEM) it has an ultimate resolution of 1 nanometer. The operating voltage range of the electron beam is from 0.7-30kV, and the probe current (10pA - 5nA) with high stability (0.2%/h). The ion beam probe voltage is set to 30 keV and the current range is 1pA – 500nA. Key features of this microscope are the in-column secondary electron detector that provides low-noise imaging during FIB material removal as well as imaging at very low voltages. EDS included in the instrument (EDAX LN cooled)

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

CNR-IOM - Istituto Officina dei Materiali,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste

Cleanroom 2

Contact person

Simone Dal Zilio

IOM-CNR | +39-0403756458

dalzilio@iom.cnr.it

DESCRIPTION

The SC7620 is designed for quality thin film deposition from an easy-to-use instrument. Designed for routine applications, the SC7620 uses a basic magnetron sputter head with a simple-to-replace disc target (gold/palladium as standard). The sputtering allows easy operation for extremely thin and uniform conductive film.

ACCESS

Notes: The use of the instrument doesn’t require the precence of a trained operator.LOCATION

CNR-IOM - Istituto Officina dei Materiali,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste

Cleanroom 2

Contact person

Simone Dal Zilio

IOM-CNR | +39-0403756458

mailto:dalzilio@iom.cnr.it

DESCRIPTION

RIE (Reactive Ion Etching) configured with several process gasses including SF6 (Sulfur Hexafluoride), CF4 (tetrafluorometane), O2 (Oxygen), and Ar (Argon). The system is indicated for dry etching of Si, SiO2, Si3N4, resist residual layer removing, Ar milling and surface activation by O2 plasma. The RIE has an Alluminum reaction chamber, suitable for long etching processes.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

CNR-IOM - Istituto Officina dei Materiali,

c/o Area Science Park - Basovizza

Strada Statale 14 km 163,5 - 34149 Trieste

Cleanroom 2

Contact person

Simone Dal Zilio

IOM-CNR | +39-0403756458

dalzilio@iom.cnr.it

DESCRIPTION

The JEM 2100F is a field emission TEM with beam energy ranging 80-200 KeV. The nominal resolution is 0.1 nm, and atomic resolution is ordinarily achieved. The image acquisition is routed by means of Orius 1000 CCD camera (Gatan). It is possible to work in STEM mode (resolution 0.2 nm) with bright field and annular dark-field detectors. The system is equipped with an EDX detector (X-Max80t, Oxford) with Aztech acquisition and analysis software.

ACCESS

The use of the instrument requires the presence of a trained operator.

LOCATION

Univerza v Novi Gorici, Materials Research Laboratory (ground floor)
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Mattia Fanetti
UNG | Tel: +386 5 3653 532

mattia.fanetti@ung.si

DESCRIPTION

The JSM 7100F is a field emission scanning electron microscope. The beam energy ranges from 1 to 30 KeV (beam energies lower than 1 KeV can also be accessed by Gentle Beam technology). In standard conditions a resolution <5 nm is achieved, while the best nominal resolution is 1.5 nm at 30 KeV. The microscope is equipped with secondary electon detector, backscattered electron detector, and trough-the-lens (TTL) energy-filtered detector. Attached equipment:

• EDX detector (X-Max 80, Oxford) with Aztech acquisition and analysis software.
• Cathodoluminescence detector (MonoCL4, Gatan), 300-750 nm
• Heating stage (Kammrath&Weiss) for nominal temperature range RT-800CACCESS

ACCESS

The use of the instrument requires the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Materials Research Laboratory (ground floor)
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Mattia Fanetti
UNG | Tel: +386 5 3653 532

mattia.fanetti@ung.si

DESCRIPTION

PECS is an apparatus to easily produce thin films and coatings on specimens. Several materials are available (C, Ag, Au/Pd, Pt, Cr, Ni). Typical deposition rate, which is measured in situ by quartz microbalance is from 0.2 to 1 Å/s. The deposition is stopped automatically at the set thickness. The sample can be rotated and rocked during deposition. An Ar+ etching gun is also present in the same system, with energy 1-10 KeV.

ACCESS

The use of the instrument requires the presence of an experienced operator. Access is allowed for external users (compatibly with internal use) which are experienced in the use of the instrument. Support can be provided at the beginning.

LOCATION

Univerza v Novi Gorici, Materials Research Laboratory (ground floor)
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Mojca Vrčon
UNG | Tel: +386 5 3653 540

mojca.vrcon@ung.si

DESCRIPTION

Several instruments for sample preparation: diamond wire saw (Well), ultrasonic disc cutter (Gatan), dimple grinder (Gatan), manual disc grinder (Gatan), rotating grinding/polishing machine, precision ion-polishing system (PIPS, Gatan). The latter is polishing with Ar+ ion beam (1-5 KeV) at grazing incidence, and is used to open a hole at the center of 3 mm disc TEM specimens.

ACCESS

The use of the instruments requires the presence of an experienced operator. Access is allowed for external users (compatibly with internal use) which are experienced in the use of the instruments. Support can be provided at the beginning.

LOCATION

Univerza v Novi Gorici, Materials Research Laboratory (ground floor)
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Mattia Fanetti, Mojca Vrčon
UNG | Tel: +386 5 3653 532 / 540

mattia.fanetti@ung.si

or mojca.vrcon@ung.si

DESCRIPTION

The JEOL X-section polisher allows for the preparation of extemely flat X-sections of a wide variety of materials, from ceramics, to metals, to porous materials. To some extent, it can operate also on soft materials.The Ar+ ion beam energy goes from 2 to 6 KeV. The specimen is rocking during the milling.X-section 1-2 mm wide and 500 m deep can be obtained in few hours.

ACCESS

The use of the instrument requires the presence of a trained operator.

LOCATION

Univerza v Novi Gorici, Materials Research Laboratory (ground floor)
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Mattia Fanetti
UNG | Tel: +386 5 3653 532

mattia.fanetti@ung.si

DESCRIPTION

The available facility operates in ultra high vacuum with a monochromatized Al K-alpha X-ray source at 1486.6 eV and an hemispherical electrons’ spectrometer from Scienta-Omicron. The ultimate energy resolution of the system is 400 meV. The spot size of the x-ray source can be varied from 400 to 950 microns. The sample is mounted on a cryogenic manipulator with controllable temperature in the range (350-20)K.
The system also offers a fast entry and a sample preparation chamber, equipped with LEED (Low Energy Electrons Diffraction), ion sputter gun, sample heating stage up to 800 C.

ACCESS

The use of the facility requires the presence of a trained operator.

LOCATION

Univerza v Novi Gorici, Laboratory of Quantum Optics (ground floor)
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Barbara Ressel
UNG | Tel: +386 5 3653 531

barbara.ressel@ung.si

DESCRIPTION

TLS is highly sensitive detection system which anables to determine a wide range of substances at the level of 10-6 AU. Consists of excitation beam laser with the emission line from 400 up to over 800 nm and different powers that are chosen according to the absorption spectrum of the detected compound. It is also equipped with low power probe beam laser, mechnaical chopper, amplified detector and optical system due to which it is possible to optimize the experimental conditions.
Attached equipment:

• FIA/μFIA – system for injective analysis
• HPLC – system for liquid chromatography
• IC – system for ionic chromatography

ACCESS

The use of the instrument requires the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Laboratory for environmental and life sciences (2nd floor), Vipavska cesta 13, 5000 Nova Gorica

Contact person

Dorota Korte
UNG | Tel: +386 5 3315 238

Dorota.Korte@ung.si

DESCRIPTION

GC-ECD/FID is a gas chromatographer equipped with Electron Capture (ECD) and Flame Ionization (FID) detector. The instrument is also equipped with an Gerstel MPS2 autosampler and head space. With the presented instrument is possible to detect a large spectrum of volatile organic compounds, present in traces. The Gestel MPS 2 autosampler allows also the thermal desorption and extraction, which allows as to determinate ultra-trace organic compounds in aqueous and gases matrices.

ACCESS

The use of the instrument requires the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Laboratory for environmental and life sciences (2nd floor), Vipavska cesta 13, 5000 Nova Gorica

Contact person

Dorota Korte
UNG | Tel: +386 5 3315 238

Dorota.Korte@ung.si

DESCRIPTION

BDS is a home-made system that consists of excitation beam laser with the emission line from 400 up to over 800 nm and different powers that are chosen according to the absorption spectrum of the measured sample. It is also equipped with low power probe beam laser, electro-optical modulator (EO), quadrant photodetector and optical system due to which it is possible to optimize the experimental conditions. EO provides modulation frequency from DC to GHz and thus, have capability of sample depth profiling and separate signals arising only from the upper layers of the sample (10 nm – 100 μm, several 10 - 100 kHz modulation frequencies) from signals originating from deeper layers and the bulk sample, which we can detect by the use of lower modulation frequencies (10 – 1000 Hz). Furthermore, due to the possibility of tight focusing of the excitation laser provides high spatial resolution of measurement providing the possibility of sample surface profiling.
BDS can be applied to observe heat transfer across thin nano-layers and nano-structures which takes place on sub-nanosecond times scales.

ACCESS

The use of the instrument requires the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Laboratory for environmental and life sciences (2nd floor), Vipavska cesta 13, 5000 Nova Gorica

Contact person

Dorota Korte
UNG | Tel: +386 5 3315 238

Dorota.Korte@ung.si

DESCRIPTION

The EPS150-TRIAX is a versatile, highly-precise manual probe station for wafers and substrates up to 150 mm. Equipped with 4 triaxial probes on DPP210 micropositioners, triaxial chunk, it allows to measure pA currents. Probes connected to 2-channel Keysight B2912A multimeter. Dark-box enclosure for EM shielding.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Laboratory for Organic Matter Physics
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Egon Pavlica
UNG | Tel: +386 5 3653 513

egon.pavlica@ung.si

DESCRIPTION

DALI model A is a versatile lithography tool, which can be used to illuminate highly-precise patterns using laser beam of diameter of 1 and 3 μm and wavelength of 375 nm. User-friendly software is used to design patterns. Optical camera is used to position and align patterns. The tool is located in a clean-room.

ACCESS

The use of the instrument require the presence of a trained operator and basic training of working in clean-room. For prolonged access, training of laser lithography can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Laboratory for Organic Matter Physics
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Egon Pavlica
UNG | Tel: +386 5 3653 513

egon.pavlica@ung.si

DESCRIPTION

A100 is a versatile atomic force microscope suited to a wide variety of applications including bioscience, surface science, semiconductor technology, magnetic media, polymer science, optics, chemistry and medicine. The close loop flexure scanning stage guarantees absolute positioning and high planarity. Kelvin-probe microscopy is available with conductive probes. Typical lateral resolution is 3nm and depends on the probe tip radius. Vertical resolution is below 1nm.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Univerza v Novi Gorici, Laboratory for Organic Matter Physics
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Egon Pavlica
UNG | Tel: +386 5 3653 513

egon.pavlica@ung.si

DESCRIPTION

Time-of-flight photoconductivity is an experimental method to measure charge carrier mobility in semiconducting and insulating materials. This setup is equipped with a tunable wavelength pulsed laser (NT342A). Therefore, in addition to time-resolved also the spectroscopic study of photon-to-electron conversion dynamics can be characterized. Sample preparation and characterization is performed in N2 glovebox. Optionally, the samples can be cooled to temperatures down to 15K in a closed-cycle He-cooled cryostat with quartz window and GHz feed-through connection.

ACCESS

The use of the instrument require the presence of a trained operator.

LOCATION

Univerza v Novi Gorici, Laboratory for Organic Matter Physics
Vipavska 11c, SI-5270 Ajdovščina, Slovenija

Contact person

Egon Pavlica
UNG | Tel: +386 5 3653 513

egon.pavlica@ung.si

DESCRIPTION

Scanning Electron Microscope (SEM) has an nominal ultimate resolution of 1.3 nm at 20 kV. The operating voltage range of the electron beam is from 0.1-30kV, and the probe current (4 pA – 20 nA) with high stability (0.2%/h). It is provided by an in-lens secondary electron detector that provides low-noise imaging. The instrument has the possibility to operate in variable pressure (VP) conditions (range 10-133 Pa), with a dedicated secondary electron detector, allowing analysis of non-conductive samples without metal coating. A back-scattered detector is available and can be operated in both high vacuum and VP conditions. The instrument is equipped with an Energy Dispersive X-ray Spectrometer (EDS) Bruker Quantax 200, based on a silicon drift detector (SDD) which avoids LN2 cooling.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

UNIVE DSMN – Dipartimento di Scienze Molecolari e Nanosistemi,
c/o Edificio ETA, Campus Scientifico
via Torino, 155
30172 Venezia-Mestre, Italia

Contact person

Federica Rigoni
DSMN | +39-041 234 6715

federica.rigoni@unive.it

DESCRIPTION

The SC7620 is designed for quality thin film deposition from an easy-to-use instrument. Designed for routine applications, the SC7620 uses a basic magnetron sputter head with a simple-to-replace disc target (gold as standard). The sputtering allows easy operation for extremely thin and uniform conductive film.

ACCESS

Notes: The use of the instrument doesn’t require the presence of a trained operator.

LOCATION

UNIVE DSMN – Dipartimento di Scienze Molecolari e Nanosistemi,
c/o Edificio ETA, Campus Scientifico
via Torino, 155
30172 Venezia-Mestre, Italia

Contact person

Federica Rigoni
DSMN | +39-041 234 6715

federica.rigoni@unive.it

DESCRIPTION

The JEOL JEM-3010 operates up to 300 kV, it is equipped with: ultra-high resolution pole pieces which guarantee a nominal point resolution of 0.14 nm; a single-tilt sample holder; double-tilt sample holder; analytical double-tilt sample holder; LN2 cryogenic single-tilt sample holder; single-tilt sample holder for transfer in vacuum or controlled atmosphere. The coupled Energy Dispersive X-rays Spectrometer (EDS) Oxford Instruments ISIS Series 300 (LN2 cooled) has an analytical resolution of 133 eV at Mn Kα.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

UNIVE DSMN – Dipartimento di Scienze Molecolari e Nanosistemi,
c/o Edificio ETA, Campus Scientifico
via Torino, 155
30172 Venezia-Mestre, Italia

Contact person

Davide Cristofori
DSMN | +39-041 234 6726

dcristofori@unive.it

DESCRIPTION

It allows to cut soft samples, e.g. polymers or biosamples, in thin slices with a 1 nm minimum nominal feed. It is possible to cut at controllable cryo temperature down to -170°C. Diamond knives for wet cryo cutting are available.

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

UNIVE DSMN – Dipartimento di Scienze Molecolari e Nanosistemi,
c/o Edificio ETA, Campus Scientifico
via Torino, 155
30172 Venezia-Mestre, Italia

Contact person

Davide Cristofori
DSMN | +39-041 234 6726

dcristofori@unive.it

DESCRIPTION

The Veeco Dimension 3100 atomic force microscope is an ambient AFM which utilizes standard and advanced SPM imaging modes for measuring properties of surfaces, nanomaterials, semiconductor/electronic devices, biomaterials, thin films... The sample stage will allow large sample sizes (up to a 6 inch wafer) with a scan size up to 90 µm in the X & Y and 6 µm in the Z direction.
Applications: Nanomaterials, Advanced materials, Electronic circuits, Thin films, MEMS/NEMS, Biotechnology.
Modes of operation: Contact mode, Tapping mode, Phase imaging, Lateral force mode,  Force imaging, Magnetic force microscopy, Electric force microscopy, Conductive AFM, Kelvin probe force microscopy.

http://www.nanocenter.si/index.php?page=atomic-force-microscope---afm

ACCESS

New users have to be supervised by an experienced user. Before reservation contact responsible person. Users are obliged to use reservation system.

Equipment is accessable 24/7.

LOCATION

Jozef Stefan Institute

Jamova 39, Ljubljana, Slovenia
room: Laboratory B

Contact person

Damjan Svetin

+386 1 477 3553

damjan.svetin@ijs.si

DESCRIPTION

DaLI is a desktop laser imaging system for mask-less photolithography and patterning. The system uses direct exposure with an UV diode laser beam (375 nm) to pattern materials sensitive to ultraviolet light. Standard i-line photoresists, such as SU-8, AZ, etc. can be used. Exchangeable exposure tool sizes (beam diameters) provide high precision details and speed (fine 0.8um, coarse 2.5um). The flexibility of this technology enables design changes and experimentation, which makes the DaLI perfect for R&D and prototyping. Conducting, isolating, semiconducting, transparent or opaque substrate can be used; max. lateral dimensions 100 mm x 100 mm, maximum thickness 10 mm.

DaLI is used in the field of micro-scale technology, microfluidics and optofluidics, nanotechnology, microelectronics, and enables microstructuring a variety of micro devices, such as integrated circuits, PCBs, MEMS, lab-on-a-chip, and other applications.

http://www.nanocenter.si/index.php?page=laser-lithography

ACCESS

Acces to the equipment is allowed to a trained user. Short trainings are provided by an experienced operators, upon agreement.

LOCATION

Jozef Stefan Institute

Jamova 39, Ljubljana, Slovenia
room: B106

Contact person

Damjan Svetin

+386 1 477 3553

damjan.svetin@ijs.si

DESCRIPTION

Optical ellipsometry is a non-destructive technique for investigation of surfaces, interfaces and thin films. It probes modifications of the polarization state of optical beam reflected from the sample. The system provides ellipsometric analysis with the lateral resolution of 1 μm. Optical illumination of the sample takes place via monochromatic radiation (spectrally filtered light from Xenon Arc lamp with the bandwidth of 6 - 12 nm) with tunable wavelength in the range from 365 nm (UV) to 1600 nm (NIR). Extension to the NIR region is a specialty of our system that makes it very suitable for investigations of semiconductor materials. Laser light source at λ = 658 nm can also be used for illumination and polarization analysis.

http://www.nanocenter.si/index.php?page=elipsometer-2

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Jozef Stefan Institute

Jamova 39, Ljubljana, Slovenia
room: Z1

Contact person

Luka Cmok

+386 1 476 3220

luka.cmok@ijs.si

DESCRIPTION

Dual Beam Helios Nanolab 650 G2 (Thermofisher Scientiffic, US) consist of ultra-high resolution Elstar SEM column with UC monochromator and Tomahawk focused ion beam (FIB) column. The configuration at Nanocenter include: in-column TLD detector, ETD detector, ICE detector, retractable CBS detector (BSE), retractable STEM (BF/DF/HAADF transmission imaging); plasma cleaner; charge compensator; Pt, C and SiOx gas injection system for material deposition; Autoprobe 200 micro-manipulator (Oxford, UK) and X-MAX 50 SDD EDX system (Oxford, UK).

E-Beam: 50V – 30 kV (1.6 pA – 100 nA), resolution: 0.8 nm @ 30 kV (STEM), 0.8 nm @ 15 kV, 0.8 nm @ 2 kV, 0.9 nm @ 1 kV, 1.5 nm @ 200 V.

I-Beam: 500V – 30 kV (4 pA – 65 nA); 4.5/2.5 nm @ 30 kV (PS/SE, method).

Instrument is used for cross-sectional analysis, nano-pattering, TEM sample preparation, 3D tomography and deposition of thin conductive or dielectric films via ion-beam induced deposition.

http://www.nanocenter.si/index.php?page=focused-ion-beam---fib

ACCESS

The use of the instrument require the presence of a trained operator. For prolonged access, training can be provided upon agreement.

LOCATION

Jozef Stefan Institute

Jamova 39, Ljubljana, Slovenia
room: Building B, basement

Contact person

Gregor Kapun

+386 1 477 3220

info@nanocenter.si